Dust

Kuba imichiza kunye nenani atom-14, kuba ngamaxesha kwiqela itafile IV ngethuba 3 no III series, ukuze kwakheke of oxides ezimbini lesilicon, ezibandakanya izinto ezimbini Si no:

• silicon monoxide, apho Si na divalent, oko okisda ifomula zekhemikhali angamelwa njengoko Sio;
• dust - yeyona silicon oxide liphezulu apho Si na tetravalent, ifomula yayo imichiza kubhaliweyo njenge SiO2.

Silicon (IV) oxide Imbonakalo crystals ngaphaya. Ukuxinana kwezi SiO2 ilingana 2.648 g / cm³. Ubuncwane linyibilike kuluhlu lobushushu ukususela 1600 ukuya 1725 ° C, amathumba ngo 2230 ° C.

SiO2 silicon oksayidi yayisaziwa ngokuba lukhuni yayo namandla ukususela kumaxesha amandulo, aziwayo kakhulu kwindalo nesanti okanye zwi, ngokunjalo kwi iindonga iseli ye diatoms. Le nto iye polymorphs ezininzi, wafumana ngokufuthi ngeendlela ezimbini:

• Crystal - ngezimbiwa zwi yendalo kunye neentlobo zayo (yikalikedo, rock ngumkhenkce, neyaspisi, neagati, lenyengane); Zwi sisiseko zentlabathi zwi, yinto izinto ezibalulekileyo zokwakha kunye izinto kushishino silicate;
• amorphous kwenzeka yiminerali yendalo isakhiwo yihakinto leyo linokuchazwa yi kwifomula SiO2 • nH2O; iintlobo ngothuli of SiO2 amorphous ezi Tripoli (umgubo rock, umhlaba diatomaceous) okanye umhlaba diatomaceous; zokwenziwa amorphous dust anhydrous - i dust, nto leyo yenziwe sodium metasilicate.

Silicon oxide SiO2 yinto oxide asidi. Lo mba umisela iipropati yayo chemical.

Fluorine idityaniswe lesilicon dioxide: SiO2 + 4F → SiF4 + O2 yenze igesi lesilicon tetrafluoride ezingenambala neoksijini, lo gama ezinye iigesi (halogens Cl2, Br2, I2) angasabeli esebenzayo.

Silicon oksayidi IV awasabela ngayo kunye മണ്ഡലം ifildi ukufumana fluorosilicic acid: SiO2 + 6HF → H2SiF6 + 2H2O . Le propati esetyenziswa kwishishini semiconductor le.

Silicon (IV) oxide ixutywe ezibunjiweyo okanye ashushu kanzulu kwealkali ukwenza silicate sodium: 2NaOH + SiO2 → Na2SiO3 + H2O.

Silicon dioxide lisabela kunye oxides metal esisiseko (umz, oxides sodium, potassium, nelothe (II), okanye umxube zinc oxide into esetyenziswa kwimveliso kwiglasi). Umzekelo, indlela sodium oxide kunye SiO2, ngenxa elo kuyilwa: sodium orthosilicate 2Na2O + SiO2 → Na4SiO4, sodium silicate Na2O + SiO2 → Na2SiO3, kunye negilasi Na2O + 6SiO2 + XO → Na2O: XO: 6SiO2. Imizekelo iglasi esinjalo ixabiso yorhwebo, zezona iglasi soda-lime, iglasi borosilicate, iglasi ayitshi.

silicon dioxide kwiqondo lobushushu eliphezulu, ukuba baye Silicon, nto leyo monoxide sukube: Si + SiO2 → 2SiO ↑.

Amaninzi, dust SiO2 isetyenziswe ukuvelisa lesilicon elemental. Inkqubo yokuxhulumana kunye iinzuzo icarbon elemental kwiqondo eliphezulu ezikweni yombane: 2C + SiO2 → Si + 2Kor. Kuyinto amandla kakhulu kakhulu. Noko ke, imveliso yayo lisetyenziswa ubugcisa semiconductor Manufacturing iiseli elanga (amandla ukukhanya iguqulelwa ibe umbane). Kwakhona Si esulungekileyo isetyenziswa kwishishini intsimbi i (ekuvelisweni ubushushu-resistant kunye lesilicon asidi-enganyangekiyo steel). Silicon ukuzithengela elemental eziyimfuneko ukufumana silicon dioxide onetyuwa, kubalulekile ukuba inani mveliso. SiO2 Natural isetyenziswa ngohlobo isanti kwezo timboni musa ukuba esimsulwa phezulu.

Inhalation olungiswe olungumgubo uthuli crystalline SiO2, nokuba ibe ncinci kakhulu (ukuya kwi 0.1 mg / m³), kunye iphika silicosis okanye umhlaza uyakwazi ukuphuhlisa ngokuhamba kwexesha. Uthuli iba yingozi xa ungena imiphunga, rhoqo okukruqulayo kuzo, ngaloo ndlela anciphise umsebenzi wabo. Kubantu, oxide lesilicon ngokohlobo amasuntswana crystalline ayichithwanga phakathi kumaxesha ngokwezonyango efanelekileyo. Le impembelelo ukudala amathuba zizifo emsebenzini kubantu abasebenza kunye nezixhobo sandblasting okanye iimveliso eziqulathe crystalline powder dust. Bantwana, amaxhoba kunganganynzeleki abakubudala abaphethwe komzimba, kwakunye nabantu abadala singagula ngokukhawuleza kakhulu.